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April 13th, 2017
KPF Joined by HOK, OS and Unit9 for Third British Information Modelling Event

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The third British Information Modelling event will take place on 11th May 2017 and is hosted by international architectural practice KPF at their London headquarters.  Bringing together innovators and experts from across the Building Information Modelling (BIM) sector the latest seminar will feature speakers from the UK government’s innovation agency, Emmy Award winning production studio Unit 9, and the largest American architecture-engineering company HOK.

The British Information Modelling seminar and open panel discussion will look at how the UK BIM strategy is developing with an update from Innovate UK on BIM Level 3 and on how practitioners and end clients are implementing BIM projects with perspectives from KPF and HOK.

The early evening event is organised by 3D Repo, the company behind multi-award winning technology that allows complex BIM datasets from multiple sources to be stored and easily accessed anywhere via the web.  The event will also feature talks on the latest innovation for the industry from Ordnance Survey, Unit 9 and UtterBerry the developers of intelligent wireless sensor systems that are helping construction company’s remotely monitor infrastructure projects.

“Previous events have attracted a high calibre of delegates from across the construction sector and with such a prestigious line up of speakers and contributing organisations, and a limited number of places, we expect this event to fill up fast,” commented 3D Repo’s CEO Dr Jozef Dobos.  ”Therefore we strongly recommend that anyone interested in attending reserves their place quickly.”

British Information Modelling takes place at 18h30 to 21h00 on 11th May 2017 at KPF’s headquarters, Langley Street, London.  The event is free of charge and places will be offered to qualifying professionals on a first come first serve basis at the following link: https://www.eventbrite.com/e/british-information-modelling-tickets-33491572194?aff=Pressrelease

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